CMOS Cleaning Station (Pettit)

Description

This fume hood has heated tanks: Piranha, SC1, SC2 cleans and Nitride etch tank. These wet baths are only available for use for CMOS-qualified processes with approved process flows. Only 4" and 6" wafers are allowed in this system.

Status

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Tool Owners

  • Claude Roney

Location

Cleanroom - Pettit

Capabilities

Wet Bench Processing - Wet Processing

Shared Drive

No share drive for this equipment.

Schedule

Equipment access control, scheduling, and training is now managed within the Shared User Management System (SUMS)
To schedule time on equipment within SUMS browse to https://sums.gatech.edu/Department/IEN log in, search for equipment, and click & drag to schedule time.

Equipment with Similar Capabilities

CMOS Cleaning Station (Marcus)

This fume hood has heated tanks: Piranha, SC2 cleans and dilute HF etch tank. These wet baths are only available for use for CMOS-qualified processes with approved process flows. Only 4" and 6" wafers are allowed in this system.

Location

Cleanroom - Marcus Inorganic

CMOS Spin Rinse Dryer (Inorganic)

Spin Rinse Dryer (SRD) is used for rinsing and drying full sized wafers in cassette, after cleaning process in CMOS Wet Bench. The SRD can hold white 4” and 5" wafer cassettes. No metal or broken wafers.

Location

Cleanroom - Marcus Inorganic

CMOS Spin Rinse Dryer - Pettit

The spin-rinse-dryer is equipped for cleaning 4-inch silicon wafers. It spins the wafers and uses deionized water and nitrogen to clean and dry the wafers.

Location

Cleanroom - Pettit

Semitool Spin Rinse Dryer -- Instructional Center

The spin-rinse-dryer is equipped for cleaning four-inch silicon wafers. It spins the wafers and uses deionized water and nitrogen to clean and dry the wafers.

Location

Cleanroom - Pettit

Verteq Spin Rinse Dryer -- Instructional Center

The Verteq spin rinse dryer is a drying system that uses centrifugal forces to dry the surface of a substrate. The liquid on the substrate surface is spun off and drained from the bowl while liquid droplets on the drying chamber surfaces are evaporated.

Location

Cleanroom - Pettit

Standard Recipes and Reports

You must first log in to see the standard recipe files.

User Shared Files

You must first log in to see shared files.

Billing Rates

There are no hourly rates for this equipment. You will only be charged for cleanroom time.

See our rates for more information.

Service Requests

You must first log in to see service requests for the CMOS Cleaning Station (Pettit).

Equipment Log

You must first log in to see the equipment log for the CMOS Cleaning Station (Pettit).

Training Sessions

Training for the IEN Cleanrooms is now managed within the Shared User Management System. (SUMS)
To get trained for the Cleanrooms, or equipment within the IEN department simply browse to http://sums.gatech.edu/Department/IEN
Log in with your Georgia Tech username and password, then browse to the IEN Equipment Group page to learn new training info.

Cleanroom

The IEN has cleanrooms in the Pettit Microelectronics Research building and the Marcus Nanotechnology Research building. Learn More

Georgia Tech Institute for Electronics and Nanotechnology

The Institute for Electronics and Nanotechnology (IEN) is a Georgia Tech interdisciplinary research institute designed to enhance support for rapidly growing research programs spanning biomedicine, materials, electronics and nanotechnology. Learn More

Visit Georgia Tech IEN

Marcus Nanotechnology Research Center
Georgia Institute of Technology
345 Ferst Drive NW
Atlanta, GA 30318
(404) 894-5100
Pettit Microelectronics Research Building
Georgia Institute of Technology
791 Atlantic Drive
Atlanta, Ga 30332
(404) 894-5100