This equipment requires radiation training
JEOL JBX-9300FS EBL System
An electron beam lithography system which has a specified resolution of 20 nm at 100 pA beam current. The system can pattern a wide variety of substrate sizes and can align to pre-existing patterns. 4 nm diameter Gaussian spot electron beam 50 kV/100 kV accelerating voltage 50 pA - 100 nA current range 50 MHz scan speed +/- 100 um vertical range automatic focus +/- 2 mm vertical range manual focus ZrO/W thermal field emission source vector scan for beam deflection small pieces (3x5 mm) up to max 300 mm (12") wafers with 9" of writing area 20 nm line width writing at 100kV 20 nm field stitching accuracy at 100kV 25 nm overlay accuracy at 100 kV
You must first log in to see the status.
Cleanroom - Pettit
CapabilitiesRadioactive - Radioactive
Shared DriveAccess Shared Drive
Equipment access control, scheduling, and training is now managed within the Shared User Management System (SUMS) To schedule time on equipment within SUMS browse to https://sums.gatech.edu/Department/IEN log in, search for equipment, and click & drag to schedule time.
Equipment with Similar Capabilities
No similar equipment.
Standard Recipes and Reports
You must first log in to see the standard recipe files.
User Shared Files
You must first log in to see shared files.
See our rates for more information.
You must first log in to see service requests for the JEOL JBX-9300FS EBL System.
You must first log in to see the equipment log for the JEOL JBX-9300FS EBL System.
Training SessionsTraining for the IEN Cleanrooms is now managed within the Shared User Management System. (SUMS) To get trained for the Cleanrooms, or equipment within the IEN department simply browse to http://sums.gatech.edu/Department/IEN Log in with your Georgia Tech username and password, then browse to the IEN Equipment Group page to learn new training info.