PVD75 RF Sputterer

Description

The RF sputterer can be used to deposit many dielectrics. Coatings are performed by accelerating ions or an argon oxygen mixture into the surface of a sputter target, which is made of the material to be applied to the sample. -Sputter two or more dissimilar materials simultaneously for complete control of film stoichiometry (co-deposition) -Max RF power 325W -Integrated touch screen control -Single substrate up to 12" diameter -Multiple substrate up to 4" diameter -Substrate fixture rotation up to 20rpm

Status

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Tool Owners

  • Charlie Suh

Location

Cleanroom - Marcus Inorganic

Capabilities

Deposition - Dielectrics Deposition - RF Sputterer Dielectrics
Deposition - Metal Deposition - Aluminum
Deposition - Metal Deposition - Copper
Deposition - Metal Deposition - Gold
Deposition - Metal Deposition - Iron
Deposition - Metal Deposition - Nickel
Deposition - Metal Deposition - Platinum
General Equipment Specification - Sputterer Systems

Shared Drive

No share drive for this equipment.

Schedule

Equipment access control, scheduling, and training is now managed within the Shared User Management System (SUMS)
To schedule time on equipment within SUMS browse to https://sums.gatech.edu/Department/IEN log in, search for equipment, and click & drag to schedule time.

Equipment with Similar Capabilities

CVC DC Sputterer

The CVC DC sputterer is used to coat samples with metals. <br> <br> Specifications:<br> -wafers/substrates up to 6"<br> -new touchscreen control system<br> -two 3" and two 8" sputter guns<br> -rotostrate for improved uniformity<br> -base pressure 5e-6 Torr

Location

Cleanroom - Pettit

Unifilm Sputterer

The Unifilm Multisource Sputtering System deposits thin metal films in a argon-enriched low vacuum. The Unifilm Sputterer has a deposition monitor to quickly and accurately measure Source distributions, a computer-controlled Planetary System, and a computer model of the source-planetary system. -Process wafers up to 4" -Deposition Processes: Aluminum, Aluminum/Silicon, Gold, Titanium, Copper, Chromium, Molybdenum, Molybdenum/Copper, Nickel, Silicon, Tantalum -DC/RF power

Location

Cleanroom - Marcus Inorganic

Standard Recipes and Reports

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User Shared Files

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Billing Rates

You are billed the cleanroom hourly rate when logged into this tool, even if you are not logged into a cleanroom.

See our rates for more information.

Service Requests

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Equipment Log

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Training Sessions

Training for the IEN Cleanrooms is now managed within the Shared User Management System. (SUMS)
To get trained for the Cleanrooms, or equipment within the IEN department simply browse to http://sums.gatech.edu/Department/IEN
Log in with your Georgia Tech username and password, then browse to the IEN Equipment Group page to learn new training info.

Cleanroom

The IEN has cleanrooms in the Pettit Microelectronics Research building and the Marcus Nanotechnology Research building. Learn More

Georgia Tech Institute for Electronics and Nanotechnology

The Institute for Electronics and Nanotechnology (IEN) is a Georgia Tech interdisciplinary research institute designed to enhance support for rapidly growing research programs spanning biomedicine, materials, electronics and nanotechnology. Learn More

Visit Georgia Tech IEN

Marcus Nanotechnology Research Center
Georgia Institute of Technology
345 Ferst Drive NW
Atlanta, GA 30318
(404) 894-5100
Pettit Microelectronics Research Building
Georgia Institute of Technology
791 Atlantic Drive
Atlanta, Ga 30332
(404) 894-5100