CVD FirstNano Graphene Furnace 1
The CVD FirstNano Graphene furnace is currently configured for graphene on Cu foil, graphene sublimation from SiC samples (epitaxial graphene), and H2 etch clean of samples. Samples are heated via 10kW RF induction heating.
-quartz chamber with graphite susceptor
-3in wafer and small pieces
-turbo pump for low pre-processing base pressure (9.0e-7 Torr)
-Ar, H2, SiH4, CH4
(keywords: silicon carbide growth materials)
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- Claude Roney
Cleanroom - Marcus Inorganic
CapabilitiesGeneral Equipment Specification - Graphene/SiGe Systems
Shared DriveNo share drive for this equipment.
Equipment access control, scheduling, and training is now managed within the Shared User Management System (SUMS) To schedule time on equipment within SUMS browse to https://sums.gatech.edu/Department/IEN log in, search for equipment, and click & drag to schedule time.
Equipment with Similar Capabilities
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Standard Recipes and Reports
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User Shared Files
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There are no hourly rates for this equipment. You will only be charged for cleanroom time.
See our rates for more information.
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Training SessionsTraining for the IEN Cleanrooms is now managed within the Shared User Management System. (SUMS) To get trained for the Cleanrooms, or equipment within the IEN department simply browse to http://sums.gatech.edu/Department/IEN Log in with your Georgia Tech username and password, then browse to the IEN Equipment Group page to learn new training info.