CVD FirstNano SiGe Nanowire Furnace
The SiGe Nanowire furnace is configured for depositing Si nanowires from metal nanoparticles such as Au. Substrate material is typically Si. Samples are heated via infrared lamps from top and bottom.
350C - 900C
SiH4, H2, Ar, Ge, 0.1% PH3
base pressure 1e-3 Torr
(keywords: silicon germanium growth materials IR)
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- John Pham
Cleanroom - Marcus Inorganic
CapabilitiesGeneral Equipment Specification - Graphene/SiGe Systems
Shared DriveNo share drive for this equipment.
Equipment access control, scheduling, and training is now managed within the Shared User Management System (SUMS) To schedule time on equipment within SUMS browse to https://sums.gatech.edu/Department/IEN log in, search for equipment, and click & drag to schedule time.
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