Karl Suss MA-6 Mask Aligner - Inorganic

Description

Mask aligners are used in photolithographic processes to transfer a pattern from a mask to a photoresist coating on the substrate. The MA-6 can handle wafers up to 6" in size, and is optimized for 435 nm wavelength.

Status

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Tool Owners

Location

Cleanroom - Marcus Inorganic

Capabilities

General Equipment Specification - Mask Aligner Systems

Shared Drive

No share drive for this equipment.

Schedule

Equipment access control, scheduling, and training is now managed within the Shared User Management System (SUMS)
To schedule time on equipment within SUMS browse to https://sums.gatech.edu/Department/IEN log in, search for equipment, and click & drag to schedule time.

Equipment with Similar Capabilities

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The MJB4 offers only 365nm wavelength light from a mercury lamp for the exposure illumination. The aligner performs exposures in vacuum (vacuum between substrate and mask), low vacuum (vacuum level between substrate and mask can be adjusted), hard (nitrogen pressure under the substrate), soft (vacuum under the substrate) contacts, and flood exposure (require with or without a mask). Line space resolution up to 0.8 micron can be achieved under optimum conditions in the vacuum mode, up to 1 micron for hard contact and up to 2 microns for soft contact. The size of substrates are ranging from small samples to 3 or 4 in wafers.

Location

PHOTOLITHOGRAPHY LAB,

EVG 620 Mask Aligner

The EVG 620 Mask aligner is configured for top and backside alignment. It has a manual cassette load with UV400 exposure optics (365nm) and 10x objective lens. The alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput.

Location

Cleanroom - Marcus Inorganic

Karl Suss MA-6 Mask Aligner - Pettit

Mask aligners are used in photolithographic processes to transfer a pattern from a mask to a photoresist coating on the substrate. The MA-6 can handle wafers up to 6" in size, and is optimized for 435 nm wavelength.

Location

Cleanroom - Pettit

Karl Suss TSA MA-6 Mask Aligner

The Karl Suss TSA MA6 Mask Aligner offers high quality exposure optics for high resolution and optimum edge quality with 0.2 micron top alignment resolution. This mask aligner offers accurate and precise gap settings for high yield and contains high intensity light sources that reduce process time. It is optimized for top size alignment (TSA) and is capable of processing up to 6"/150mm wafers. The components consist of UV250 optics and monitor and Olympus 5x, 10x, and 20x objectives lenses.

Location

Cleanroom - Marcus Inorganic

Standard Recipes and Reports

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User Shared Files

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Billing Rates

There are no hourly rates for this equipment. You will only be charged for cleanroom time.

See our rates for more information.

Service Requests

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Equipment Log

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Training Sessions

Training for the IEN Cleanrooms is now managed within the Shared User Management System. (SUMS)
To get trained for the Cleanrooms, or equipment within the IEN department simply browse to http://sums.gatech.edu/Department/IEN
Log in with your Georgia Tech username and password, then browse to the IEN Equipment Group page to learn new training info.

Cleanroom

The IEN has cleanrooms in the Pettit Microelectronics Research building and the Marcus Nanotechnology Research building. Learn More

Georgia Tech Institute for Electronics and Nanotechnology

The Institute for Electronics and Nanotechnology (IEN) is a Georgia Tech interdisciplinary research institute designed to enhance support for rapidly growing research programs spanning biomedicine, materials, electronics and nanotechnology. Learn More

Visit Georgia Tech IEN

Marcus Nanotechnology Research Center
Georgia Institute of Technology
345 Ferst Drive NW
Atlanta, GA 30318
(404) 894-5100
Pettit Microelectronics Research Building
Georgia Institute of Technology
791 Atlantic Drive
Atlanta, Ga 30332
(404) 894-5100