BLE Spinner

Description

The BLE Photoresist Spinner is a spinner/hot plate combo mounted inside of a white polypropylene body. This is a fully manual spinner accustomed for use with 4” or 6” wafers (or pieces mounted on a 4” carrier) only. This spinner is self-exhausted and has readily available workspace and a programmable hotplate.

Status

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Tool Owners

  • Tran-Vinh Nguyen

Location

Cleanroom - Marcus Inorganic

Capabilities

Lithography - Spin Coating

Shared Drive

No share drive for this equipment.

Schedule

Equipment access control, scheduling, and training is now managed within the Shared User Management System (SUMS)
To schedule time on equipment within SUMS browse to https://sums.gatech.edu/Department/IEN log in, search for equipment, and click & drag to schedule time.

Equipment with Similar Capabilities

CEE 100CB Spinner

Spin coaters are used to distribute photoresist in a thin uniform layer by spinning the substrate. The CEE 100CB spinners are reserved for photoresist use. Other materials must be done with the SCS spinners. Also equipped with hotplates. (Six hotplates are available throughout the cleanroom.) The time limit on this spinner is one hour.

Location

-

Karl Suss RC8 Spinner - Inorganic

The RC8 programmable process spinner is reserved for photoresist use. Spin coatings of other materials must be done with the SCS spinners. Photoresist coatings are usually performed with the CEE 100CB spin coaters. This spinner is capable of processing up to 6" wafers, has motorized and programmable position dispense arm, maximum speed of 5,000 rpm and an acceleration of 100 to 5000 rpm/s.

Location

Cleanroom - Marcus Inorganic

Karl Suss RC8 Spinner - Pettit

The RC8 programmable process spinner is reserved for photoresist use. Spin coatings of other materials must be done with the SCS spinners. Photoresist coatings are usually performed with the CEE 100CB spin coaters. This spinner is capable of processing up to 6" wafers, has motorized and programmable position dispense arm, maximum speed of 5,000 rpm and an acceleration of 100 to 5000 rpm/s.

Location

Cleanroom - Pettit

SCS G3P8 Spin Coater 1 (small pieces)

The SCS G3 Spin Coater series accurately applies liquid coating materials on planar substrates. This spin coater stores and executes up to 30 programs with up to 20 steps each. Each step of the cycle can be defined in the range of 0-9999RPM with ramp times from 0.1 to 25.5 seconds. Ramp-up time is dependent on the chuck size and the substrate weight. A single step may have a dwell time of up to 999 seconds. Coating cycles are interruptible by the operator at any time. This spin coater has chucks designed for wafers or pieces 1-4 inches.

Location

Cleanroom - Marcus Inorganic

SCS G3P8 Spin Coater 2 - Pettit

The SCS G3 Spin Coater series accurately applies liquid coating materials on planar substrates. This spin coater stores and executes up to 30 programs with up to 20 steps each. Each step of the cycle can be defined in the range of 0-9999RPM with ramp times from 0.1 to 25.5 seconds. Ramp-up time is dependent on the chuck size and the substrate weight. A single step may have a dwell time of up to 999 seconds. Coating cycles are interruptible by the operator at any time. This spin coater has chucks designed for wafers or pieces 1-4 inches.

Location

Cleanroom - Pettit

SCS G3P8 Spin Coater 3 - Inorganic

The SCS G3 Spin Coater series accurately applies liquid coating materials on planar substrates. This spin coater stores and executes up to 30 programs with up to 20 steps each. Each step of the cycle can be defined in the range of 0-9999RPM with ramp times from 0.1 to 25.5 seconds. Ramp-up time is dependent on the chuck size and the substrate weight. A single step may have a dwell time of up to 999 seconds. Coating cycles are interruptible by the operator at any time. This spin coater has chucks designed for wafers or pieces 1-4 inches.

Location

Cleanroom - Marcus Inorganic

Specialty Coating Systems (remove this)

The SCS P6700 is a general use spin-coater with the following features:-small pieces up to 4” wafer-3 steps per program (4th ramp step for deceleration) -each step includes ramp and hold-100-8000 RPMs-Total recipe time up to 999 seconds-Acceleration/deceleration times 1-30 secs-Bowl size: 12” diam. PTFE coated

Location

-

Standard Recipes and Reports

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User Shared Files

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Billing Rates

There are no hourly rates for this equipment. You will only be charged for cleanroom time.

See our rates for more information.

Service Requests

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Equipment Log

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Training Sessions

Training for the IEN Cleanrooms is now managed within the Shared User Management System. (SUMS)
To get trained for the Cleanrooms, or equipment within the IEN department simply browse to http://sums.gatech.edu/Department/IEN
Log in with your Georgia Tech username and password, then browse to the IEN Equipment Group page to learn new training info.

Cleanroom

The IEN has cleanrooms in the Pettit Microelectronics Research building and the Marcus Nanotechnology Research building. Learn More

Georgia Tech Institute for Electronics and Nanotechnology

The Institute for Electronics and Nanotechnology (IEN) is a Georgia Tech interdisciplinary research institute designed to enhance support for rapidly growing research programs spanning biomedicine, materials, electronics and nanotechnology. Learn More

Visit Georgia Tech IEN

Marcus Nanotechnology Research Center
Georgia Institute of Technology
345 Ferst Drive NW
Atlanta, GA 30318
(404) 894-5100
Pettit Microelectronics Research Building
Georgia Institute of Technology
791 Atlantic Drive
Atlanta, Ga 30332
(404) 894-5100