Plasma-Therm RIE

Description

RIEs (Reactive Ion Etcher) are used to etch various materials, such as semiconductors, polymers, and various metals using reactive gases in a RF (radio frequency) reactive ion plasma. This RIE system operates at 13.56 MHz and has two chambers that are used for the etching of dielectrics and metals such as Al, Cr, and Ti. Small pieces up to 10" substrates are allowed in this system.

Status

You must first log in to see the status.

Tool Owners

  • Tran-Vinh Nguyen

Location

Cleanroom - Pettit

Capabilities

Etch - Dielectrics - Indium Phosphide
Etch - Dielectrics - Silicon Nitride
Etch - Dielectrics - Silicon Oxide
Etch - Dielectrics - Zinc Sulfide
Etch - Metals - Aluminum
Etch - Metals - Chrome
Etch - Polymer - Photoresist
Etch - Polymer - Polyimide
Etch - Semiconductor
Etch - Silicon
General Equipment Specification - RIE Systems
General Equipment Specification (old) - Substrate Size - 2 in wafer

Shared Drive

No share drive for this equipment.

Schedule

Equipment access control, scheduling, and training is now managed within the Shared User Management System (SUMS)
To schedule time on equipment within SUMS browse to https://sums.gatech.edu/Department/IEN log in, search for equipment, and click & drag to schedule time.

Equipment with Similar Capabilities

Oxford End-point RIE

An Oxford Endpoint RIE (Reactive Ion Etcher) system is designed to etch materials such as SiO2 and SiXNY. This RIE system operates at 13.56MHz and has one chamber that is used for etching of dielectric materials. This machine is not available for metal etching. A graphite plate is available to reduce temperature build up during a long process run. Small pieces up to 10" wafers are allowed in this system.

Location

Cleanroom - Marcus Inorganic

Plasma-Therm SLR RIE

RIEs (Reactive Ion Etcher) are used to etch various materials, such as semiconductors, polymers, and various metals using reactive gases in a RF (radio frequency) reactive ion plasma. This RIE system operates at 13.56 MHz and etches III-V materials and metals such as Al, Cr, and Ti. Small pieces up to 10" substrates are allowed in this system.

Location

Cleanroom - Pettit

Unaxis RIE

RIEs (Reactive Ion Etcher) are used to etch various materials, such as semiconductors, polymers, and various metals using reactive gases in a RF (radio frequency) reactive ion plasma. This RIE system operates at 13.56 MHz and etches metals such as Al, Cr, and Ti. Small pieces up to 10" wafers are allowed in this system.

Location

Cleanroom - Marcus Inorganic

Vision RIE 1

The Vision 320 RIE is a manually loaded Reactive Ion Etcher plasma system. It is used to etch dielectric materials and shallow silicon by using SF6 as an etching gas. The Vision RIE has a permanent graphite plate in order to reduce temperature build up during a long process run. Small pieces up to 10" substrates are allowed in this system.

Location

Cleanroom - Pettit

Vision RIE 2

The Vision 320 RIE is a manually loaded Reactive Ion Etcher plasma system. It is used to etch dielectric materials and shallow silicon by using SF6 as an etching gas. The Vision RIE has a permanent graphite plate in order to reduce temperature build up during a long process run.

Location

Cleanroom - Marcus Inorganic

Standard Recipes and Reports

You must first log in to see the standard recipe files.

User Shared Files

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Billing Rates

You are billed the cleanroom hourly rate when logged into this tool, even if you are not logged into a cleanroom.

See our rates for more information.

Service Requests

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Equipment Log

You must first log in to see the equipment log for the Plasma-Therm RIE.

Training Sessions

Training for the IEN Cleanrooms is now managed within the Shared User Management System. (SUMS)
To get trained for the Cleanrooms, or equipment within the IEN department simply browse to http://sums.gatech.edu/Department/IEN
Log in with your Georgia Tech username and password, then browse to the IEN Equipment Group page to learn new training info.

Cleanroom

The IEN has cleanrooms in the Pettit Microelectronics Research building and the Marcus Nanotechnology Research building. Learn More

Georgia Tech Institute for Electronics and Nanotechnology

The Institute for Electronics and Nanotechnology (IEN) is a Georgia Tech interdisciplinary research institute designed to enhance support for rapidly growing research programs spanning biomedicine, materials, electronics and nanotechnology. Learn More

Visit Georgia Tech IEN

Marcus Nanotechnology Research Center
Georgia Institute of Technology
345 Ferst Drive NW
Atlanta, GA 30318
(404) 894-5100
Pettit Microelectronics Research Building
Georgia Institute of Technology
791 Atlantic Drive
Atlanta, Ga 30332
(404) 894-5100