Schmid APCVD


The Schmid APCVD is an atmospheric pressure roller furnace designed to deposit phosphorous or boron doped SiO2, undoped SiO2, and Al2O3. A second chamber is available for in-situ SiO2 encapsulation immediately after the initial deposition layer.

- up to 550C process temperature
- up to 6" square samples (up to 0.20"/5.0mm thick)
- typically 24-48 in/min roller speed


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Tool Owners

  • John Pham


Cleanroom - Marcus Inorganic


ALD - Dielectrics Deposition - Silica
Deposition - Aluminum Oxide
Thermal Processing - Film Growth
Thermal Processing - Materials Growth

Shared Drive

No share drive for this equipment.


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Equipment with Similar Capabilities

No similar equipment.

Standard Recipes and Reports

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User Shared Files

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Billing Rates

There are no hourly rates for this equipment. You will only be charged for cleanroom time.

See our rates for more information.

Service Requests

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Equipment Log

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Training Sessions

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The IEN has cleanrooms in the Pettit Microelectronics Research building and the Marcus Nanotechnology Research building. Learn More

Georgia Tech Institute for Electronics and Nanotechnology

The Institute for Electronics and Nanotechnology (IEN) is a Georgia Tech interdisciplinary research institute designed to enhance support for rapidly growing research programs spanning biomedicine, materials, electronics and nanotechnology. Learn More

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Marcus Nanotechnology Research Center
Georgia Institute of Technology
345 Ferst Drive NW
Atlanta, GA 30318
(404) 894-5100
Pettit Microelectronics Research Building
Georgia Institute of Technology
791 Atlantic Drive
Atlanta, Ga 30332
(404) 894-5100