The Schmid APCVD is an atmospheric pressure roller furnace designed to deposit phosphorous or boron doped SiO2, undoped SiO2, and Al2O3. A second chamber is available for in-situ SiO2 encapsulation immediately after the initial deposition layer.
- up to 550C process temperature
- up to 6" square samples (up to 0.20"/5.0mm thick)
- typically 24-48 in/min roller speed
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- John Pham
Cleanroom - Marcus Inorganic
CapabilitiesALD - Dielectrics Deposition - Silica
Deposition - Aluminum Oxide
Thermal Processing - Film Growth
Thermal Processing - Materials Growth
Shared DriveNo share drive for this equipment.
Equipment access control, scheduling, and training is now managed within the Shared User Management System (SUMS) To schedule time on equipment within SUMS browse to https://sums.gatech.edu/Department/IEN log in, search for equipment, and click & drag to schedule time.
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Standard Recipes and Reports
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User Shared Files
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There are no hourly rates for this equipment. You will only be charged for cleanroom time.
See our rates for more information.
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Training SessionsTraining for the IEN Cleanrooms is now managed within the Shared User Management System. (SUMS) To get trained for the Cleanrooms, or equipment within the IEN department simply browse to http://sums.gatech.edu/Department/IEN Log in with your Georgia Tech username and password, then browse to the IEN Equipment Group page to learn new training info.