The STS ICP is a CMOS-compatible tool used for integrated MEMS-CMOS processes, and is meant for narrow (<10 micron in width) high aspect-ratio trench etching (DRIE) in silicon and SOI wafers. This system is used only for etching high aspect-ratio trenches in silicon (BOSCH process) and 4" SOI wafers.


You must first log in to see the status.

Tool Owners

  • Tran-Vinh Nguyen


Cleanroom - Pettit


Etch - Silicon
General Equipment Specification - ICP Systems

Shared Drive

Access Shared Drive


Equipment access control, scheduling, and training is now managed within the Shared User Management System (SUMS)
To schedule time on equipment within SUMS browse to log in, search for equipment, and click & drag to schedule time.

Equipment with Similar Capabilities

Oxford Cryogenic ICP

The Oxford Cryogenic ICP (Inductively Coupled Plasma) etching (DRIE) produces high ion densities and hence fast etch rates, while allowing separate control of ion density and ion energy (giving a low damage capability). Wafer clamping and helium back-side cooling is the standard and provides excellent temperature control with the cryogenic to provide a wide temperature range (-150C to 400C). Only 4" wafers are allowed in this system.


Cleanroom - Marcus Inorganic

PlasmaTherm ICP

An ICP (inductively coupled plasma) etcher (DRIE) can be used to etch a variety of materials. This ICP is equipped with two chambers -- one is dedicated to deep anisotropic silicon (BOSCH process) trench etching and the other is used for silicon dioxide and polymer etching. Wafer sizes 4" and 6" are allowed in the chambers.


Cleanroom - Pettit


The Advanced Oxide Etch (AOE) source is a revolutionary design, based on STS' well-established Inductively Coupled Plasma (ICP) technology. The AEO source is originally conceived to overcome the limitations of conventional high density plasma sources for SiO2 deep etch applications. It is also proven to be suitable for deep etching of quartz, pyrex, and fused silica for 4" substrates and 6" substrates by request.


Cleanroom - Pettit


The STS HRM is a CMOS-Compatible tool used for integrated MEMS-CMOS processes, and is meant for narrow (<10 micron in width) high aspect-ratio trench etching for 4" or 6" silicon (DRIE) and SOI wafers and a high etch rate. Non-CMOS-compatible materials and masks are NOT allowed in this tool.


Cleanroom - Marcus Inorganic

STS Pegasus ICP

The STS Pegasus ICP is a deep reactive ion etcher (DRIE) with a dual plasma source design. It is designed to etch silicon through a Bosch Process. The process allows the sample to have a more uniform, anisotropic etch on 4" wafers. The STS Pegasus ICP is unique and provides users with high etch rates, excellent uniformity, and results in a highly concentrated and uniformed distribution of radicals.


Cleanroom - Pettit

Standard Recipes and Reports

You must first log in to see the standard recipe files.

User Shared Files

You must first log in to see shared files.

Billing Rates

You are billed the cleanroom hourly rate when logged into this tool, even if you are not logged into a cleanroom.

See our rates for more information.

Service Requests

You must first log in to see service requests for the STS ICP.

Equipment Log

You must first log in to see the equipment log for the STS ICP.

Training Sessions

Training for the IEN Cleanrooms is now managed within the Shared User Management System. (SUMS)
To get trained for the Cleanrooms, or equipment within the IEN department simply browse to
Log in with your Georgia Tech username and password, then browse to the IEN Equipment Group page to learn new training info.


The IEN has cleanrooms in the Pettit Microelectronics Research building and the Marcus Nanotechnology Research building. Learn More

Georgia Tech Institute for Electronics and Nanotechnology

The Institute for Electronics and Nanotechnology (IEN) is a Georgia Tech interdisciplinary research institute designed to enhance support for rapidly growing research programs spanning biomedicine, materials, electronics and nanotechnology. Learn More

Visit Georgia Tech IEN

Marcus Nanotechnology Research Center
Georgia Institute of Technology
345 Ferst Drive NW
Atlanta, GA 30318
(404) 894-5100
Pettit Microelectronics Research Building
Georgia Institute of Technology
791 Atlantic Drive
Atlanta, Ga 30332
(404) 894-5100