Information about substrate cleaning, deposition, doping, etching, mask design, lithography,
thermal processing, and metrology.
These modules are standardized procedures for various tasks accomplished in the cleanroom. Each module consists of list of necessary supplies and the procedures that should be followed during that processing step. We have also tried to include common mistakes and questions about each processing step.
These procedures should help with repeatability in our facility and help you standardize your process. Both new and old users show find this information useful.
Chemicals that are provided to all users.
CMOS services provided by the group including oxidations, nitridations,
polysilicon, doping, and cleaning services.
Detailed information about all of our equipment and their basic capabilities.
Standard recipes provided by the manufacturers for use in their processing tools. Georgia Tech access only.
This is a temporary website for Georgia Tech IEN Cleanroom processing library. Users can find the standard recipes, operation procedures, and updated baseline information. Users are welcome to use it and give us some feedback.
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A third-party silicon thermal oxide thickness calculator.